Large area deposition of thick diamond film by direct-current PACVD

Thin Solid Films

Volumn 341, Issue 1, 1999, Pages 202-206

  Baik, Y J ^a   Lee, J K ^a   Lee, W S ^a   Eun, K Y ^a  

^a Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; DEPOSITION; ELECTRIC ARCS; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; METHANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE; SUBSTRATES; TEMPERATURE;

DIFFUSE GLOW; DIRECT CURRENT PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION; DIRECT CURRENT POWER SUPPLY; LARGE AREA DEPOSITION; LARGE SINGLE CATHODE GEOMETRY; MULTI CATHODE GEOMETRY;

DIAMOND FILMS;

EID: 0032689783     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01550-8     Document Type: Article

References (9)

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