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Volumn 43, Issue 7, 1999, Pages 1313-1316

High performance δ-modulation-doped Si/SiGe heterostructure FET's grown by MBE

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; GATES (TRANSISTOR); HETEROJUNCTIONS; LEAKAGE CURRENTS; MOLECULAR BEAM EPITAXY; SEMICONDUCTING BORON; SEMICONDUCTOR QUANTUM WELLS; TRANSCONDUCTANCE;

EID: 0032687163     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(99)00063-5     Document Type: Article
Times cited : (5)

References (9)
  • 2
    • 0029273499 scopus 로고
    • A Novel Delta-Doped GaAs/InGaAs Real-Space Transfer Transistor with High Peat-to-Valley Ratio and High-Current Driving Capability
    • Wu C.L., Hsu W.C., Shieh H.M., Tsai M.S. A Novel Delta-Doped GaAs/InGaAs Real-Space Transfer Transistor with High Peat-to-Valley Ratio and High-Current Driving Capability. IEEE Electron Device Lett. EDL-16:1995;112.
    • (1995) IEEE Electron Device Lett , vol.16 , pp. 112
    • Wu, C.L.1    Hsu, W.C.2    Shieh, H.M.3    Tsai, M.S.4
  • 4
    • 0029208268 scopus 로고
    • Device Linearity Improvement by Al0.3Ga0.7As/ln0.2Ga0.8As Heterostructure Doped-Channel FETs
    • Chan Y.J., Yang M.T. Device Linearity Improvement by Al0.3Ga0.7As/ln0.2Ga0.8As Heterostructure Doped-Channel FETs. IEEE Electron Device Lett. EDL-16:1995;33.
    • (1995) IEEE Electron Device Lett , vol.16 , pp. 33
    • Chan, Y.J.1    Yang, M.T.2
  • 5
    • 0027667569 scopus 로고
    • Boron Delta-Doped Si and Ge0.2Si0.8 Channel Metal-Semiconductor Field-Effect Transistors Grown by Molecular-Beam Epitaxy
    • Wang S.J., Wu S.L., Chung H.D. Boron Delta-Doped Si and Ge0.2Si0.8 Channel Metal-Semiconductor Field-Effect Transistors Grown by Molecular-Beam Epitaxy. Jpn J Appl Phys. 32:1993;L1315.
    • (1993) Jpn J Appl Phys , vol.32 , pp. 1315
    • Wang, S.J.1    Wu, S.L.2    Chung, H.D.3
  • 7
    • 0027908431 scopus 로고
    • P-Type SiGe Channel Modulation-Doped Field-Effect Transistors with Post-Evaporation Patterned Submicrometer Schottky Gates
    • König U., Schäffler F. P-Type SiGe Channel Modulation-Doped Field-Effect Transistors with Post-Evaporation Patterned Submicrometer Schottky Gates. Electron Lett. 29:1993;486.
    • (1993) Electron Lett , vol.29 , pp. 486
    • König, U.1    Schäffler, F.2
  • 9
    • 0042035026 scopus 로고
    • Boron Delta-Doped Si Metal-Semiconductor Field-Effect Transistor Grown by Molecular-Beam Epitaxy
    • Wu S.L., Carns T.K., Wang S.J., Wang K.L. Boron Delta-Doped Si Metal-Semiconductor Field-Effect Transistor Grown by Molecular-Beam Epitaxy. Appl Phys Lett. 63:1993;1363.
    • (1993) Appl Phys Lett , vol.63 , pp. 1363
    • Wu, S.L.1    Carns, T.K.2    Wang, S.J.3    Wang, K.L.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.