Description of metal-vapour production in a hollow-cylindrical magnetron sputtering discharge

Journal of Physics D: Applied Physics

Volumn 32, Issue 9, 1999, Pages 1039-1043

  Li, Jun ^a   Yuan, Run Zhang ^a   Chen, Qing Ming ^b  

^a WUHAN UNIVERSITY OF TECHNOLOGY   (China)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC DISCHARGES; MATHEMATICAL MODELS;

HOLLOW-CYLINDRICAL MAGNETRON SPUTTERING DISCHARGES;

MAGNETRON SPUTTERING;

EID: 0032682163     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/32/9/315     Document Type: Article

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