Pulsed magnetically confined discharge for copper vapor lasers

Review of Scientific Instruments

Volumn 67, Issue 11, 1996, Pages 4029-4030

  Li, Jun ^a   Chen, Qing Ming ^a   Zhang, Wang ^a   Xie, Ming Jie ^a   Li, Zai Guang ^a   Pan, J J ^b  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b E TEK Dynamics Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0344592051     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1147272     Document Type: Article

References (8)

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