Highly oriented mesostructured thin films: shear-induced deposition of optically anisotropic coatings of tungsten oxide/surfactant composites

Langmuir

Volumn 15, Issue 13, 1999, Pages 4544-4550

  Hillhouse, Hugh W ^a   Van Egmond, Jan W ^a   Tsapatsis, Michael ^a  

^a University of Massachusetts   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; DEPOSITION; OPTICAL VARIABLES MEASUREMENT; SCANNING ELECTRON MICROSCOPY; SHEAR STRESS; STRUCTURE (COMPOSITION); SURFACE ACTIVE AGENTS; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

MESOSTRUCTURED THIN FILMS; SHEAR INDUCED DEPOSITION;

THIN FILMS;

EID: 0032681879     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la9810051     Document Type: Article

References (4)

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3. Raman, N. K.; Anderson, M. T.; Brinker, C. J. Chem. Mater. 1996, 8, 1682-1701.
4. Ozin, G. A.; Chomski, E.; Khushalani, D.; MacLachlan, M. J. Curr. Opin. Colloid Interface Sci. 1998, 3, 181-193.