Advanced PECVD processes for highly electron emitting diamond-like-carbon

Thin Solid Films

Volumn 341, Issue 1, 1999, Pages 196-201

  Jang, J ^a   Moon, J H ^a   Han, E J ^a   Chung, S J ^a  

^a Kyung Hee University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOYS; CARBON; CURRENT DENSITY; ELECTRIC FIELDS; ELECTRON EMISSION; HYDROGEN; METHANE; NITROGEN; ORGANIC COMPOUNDS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS;

DIAMOND LIKE CARBON FILMS; FLOW RATE RATIO; GAS PHASE DOPING; LAYER BY LAYER DEPOSITION;

DIAMOND FILMS;

EID: 0032678793     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01526-0     Document Type: Article

References (16)

1. Veerasamy V.S., Amaratunga G.A.J., Davis C.A., Milne W.I., Hewitt P. Solid-State Electron. 37:1994;319.
2. Chuang F.Y., Sun C.Y., Cheng H.F., Lin I.N. Appl. Phys. Lett. 68:1996;1666.
3. Cuomo J.J., Pappas D.L., Lossy R., Doyle J.P., Bruley J., Dibello W., Krakow W. J. Vac. Sci. Technol. A. 10:1992;3414.
4. Mckenzie D.R., Muller D., Pailthrope B.A. Phys. Rev. B. 48:1993;17954.
5. Veersamy V.S., Yuan J., Amaratunga G.A., Milne W.I., Gilkes K.W.R., Weiler M., Brown L.M. Phys. Rev. B. 48:1993;17954.
6. Davis C.A., McKenzie D.R., Yin Y., Kravtchinskaia E., Amaratunga G.A., Veerasamy V.S. Philipp. Mag. B. 69:1994;1133.
7. Zou J.W., Reichelt K., Schmidt K., Dischler B. J. Appl. Phys. 65:1989;3914.
8. Amaratunga G.A.J., Silva S.R.P. Appl. Phys. Lett. 68:1996;2529.
9. Veerasamy V.S., Amaratunga G.A.J., Davis C.A., Timbs A.E., Milne W.I., Mackenzie D.R. J. Phys. Condens. Matter. 5:1993;169.
10. Park K.C., Moon J.H., Jang J. Appl. Phys. Lett. 68:1996;3594.
11. Shimada Y., Mutsukura N., Machi Y. J. Appl. Phys. 71:1992;4019.
12. J. Tauc, in: J. Tauc (Ed.), Amorphous and Liquid Semiconductors, Plenum, London, 1974, p. 15.
13. Veerasamy V.S., Yuan J., Amaratunga G.A.J., Milne W.I., Gilkes K.W.R., Weiler M., Brown L.M. Appl. Phys. 48:1993;954.
14. Kajihara S.A., Antonelli A., Bernholc J., Car R. Phys. Rev. Lett. 66:1991;2010.
15. Mutsukura N., Inoue S., Machi Y. J. Appl. Phys. 71:1992;43.
16. Lide Dabid R., et al. CRC Handbook of Chemistry and Physics. 74th ed. 1994;CRC Press, Inc, Florida. p. 9-123.