Synthesis of (Ba,Sr)TiO3 thin films by plasma-activated pulsed laser deposition technique

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 5 A, 1999, Pages 2869-2873

  Arakawa, Taro ^a   Arai, Naonori ^a   Yin, Huaqing ^a,b   Kaneda, Hisayoshi ^a   Sugahara, Masanori ^a   Haneji, Nobuo ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

(Ba,Sr)Tio3; Dielectric constant; Leakage current; PA PLD; Pulsed laser deposition (PLD); Surface morphology; Thin film; XPS; XRD

Indexed keywords

BARIUM COMPOUNDS; CRYSTAL ORIENTATION; DEPOSITION; LEAKAGE CURRENTS; MORPHOLOGY; PERMITTIVITY; PLASMA APPLICATIONS; PULSED LASER APPLICATIONS; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL); THIN FILMS;

BARIUM STRONTIUM TITANATE; PULSED LASER DEPOSITION (PLD);

DIELECTRIC FILMS;

EID: 0032674776     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.2869     Document Type: Article

References (8)

1. F. Tcheliebou and S. Baik: J. Appl. Phys. 80 (1996) 7046.
2. K. Kinoshita, H. Ishibashi and T. Kobayashi: Jpn. J. Appl. Phys. 33 (1994) L417.
3. L. C. Chen: Pulsed Laser Deposition of Thin Films (Wiley, New York, 1994) p. 167.
4. M. D. Strikovsky, E. B. Klyuenkov, S. V. Gaponov, J. Schubert and C. A. Coptli: Appl. Phys. Lett. 63 (1993) 1146.
5. S. B. Krupanidhi and D. Roy: J. Appl. Phys. 72 (1992) 620.
6. Tien-I Bao, S. H. Tsai and Lin I: J. Appl. Phys. 78 (1995) 489.
7. C. S. Huang, T. Y. Tseng, B. C. Chung, C. H. Tsai, S. S. Hsu and I. N. Lin: J. Appl. Phys. 78 (1995) 7181.
8. H. Q. Yin, Y. Ucda, T. Arakawa, Y. Kaneda, T. Yoshikawa, N. Haneji and M. Sugahara: Thin Solid Films 338 (1999) 20.