Influence of internal diffusion barriers on carbon diffusion in pure titanium and Ti-6Al-4V during diamond deposition

Diamond and Related Materials

Volumn 8, Issue 6, 1999, Pages 1022-1032

  De Barros, M I ^a   Rats, D ^a   Vandenbulcke, L ^a   Farges, G ^b  

^a CNRS   (France)

^b DGA/Centre Technique d'Arcueil   (France)

Author keywords

Diamond; Diffusion; Diffusion barriers; Ti 6Al 4V; Titanium; Titanium carbide

Indexed keywords

DIFFUSION IN SOLIDS; ENERGY DISPERSIVE SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SOLID SOLUTIONS; TITANIUM; TITANIUM ALLOYS; TITANIUM CARBIDE; VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS;

INTERNAL DIFFUSION BARRIERS; MICROWAVE PLASMA; PHYSICAL VAPOR DEPOSITION (PVD);

DIAMOND FILMS;

EID: 0032672844     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(98)00439-7     Document Type: Article

References (49)

1. J. Wilks, E. Wilks, Properties and Applications of Diamond, Butterwood-Heinemann, Oxford, 1991.
2. Drory M.D., Hutchinson J.W. Science. 263:1994;1753.
3. Heinrich G., Grögler T., Rosiwal S.M., Singer R.F., Stöckel R., Ley L. Diamond Relat. Mater. 5:1996;304.
4. Ager III J.W., Drory M.D. Phys. Rev. B. 48:1993;2601.
5. Vandenbulcke L., Rats D., Herbin R. Mater. Lett. 27:1996;77.
6. Rats D., Vandenbulcke L., Herbin R., Benoit R., Erre R., Serin V., Sevely J. Thin Solid Films. 270:1995;177.
7. Lindlbauer A., Haubner R., Lux B. Diamond Films Technol. 2:1992;81.
8. Chen H., Nielsen M.L., Gold C.J., Dillon R.O., DiGregorio J., Furtak T. Thin Solid Films. 212:1992;169.
9. Ong T.P., Chang R.P. Appl. Phys. Lett. 58:1991;358.
10. Chen X., Narayan J. J. Appl. Phys. 74:1993;4168.
11. Spinnewyn J., Nesladek M., Asinari C. Diamond Relat. Mater. 2:1993;361.
12. Nesladek M., Asinari C., Spinnewyn J., Lebout R., Lorent R., D'Olieslaeger M. Diamond Relat. Mater. 3:1993;912.
13. Lorentz H.P. Diamond Relat. Mater. 4:1995;1088.
14. Fayer A., Glozman O., Hoffman A. Appl. Phys. Lett. 67:1995;2299.
15. Weiser P.S., Prawer S., Hoffman A., Manory R., Paterson P.J.K., Stuart S.A. Mater. Res. Soc. 242:1992;63.
16. Weiser P.S., Prawer S. Diamond Relat. Mater. 4:1995;710.
17. Shih H.C., Sung C.P., Fan W.L., Lee C.K. Surf. Coat. Technol. 57:1993;197.
18. Isozaki T., Saito Y., Masuda A., Fukumoto K., Chosa M., Ito T., Oles E.J., Inspector A., Bauer C.E. Diamond Relat. Mater. 2:1993;1156.
19. R. Porat, ISCAR Ltd, European Patent No. 0514 032 A1, 1992.
20. N.I. Omori, T.I. Nomura, Sumitomo Electric Ind. Ltd, Eur. Patent No. 0550 763 A1, 1992.
21. L. Vandenbulcke, D. Rats, G. Farges, Fr. Patent No. 2 733 255, 1995.
22. Vandenbulcke L., Rats D., Benoit R., Erre R. C.R. Acad. Sci. Paris, Série IIb. 324:1997;399.
23. Vandenbulcke L., Rats D., De Barros M.I., Benoît R., Erre R., Andreazza P. Appl. Phys. Lett. 72:1998;501.
24. B. Lux, R. Haubner, in: J.C. Angus, P. Koidl (Eds.), Diamond and Diamond-like Films and Coatings, Plenum, New York, 1991, p. 579.
25. Farges G., Beauprez E., Sainte Catherine M.C. Surf. Coat. Technol. 54 55:1992;115.
26. E.K. Storms, Refractory Carbides, Academic Press, New York, 1967, Vol. 2, p. 1.
27. M. Hansen, Constitution of Binary Alloys, in Metallurgy and Metallurgical Engineering Series, McGraw-Hill, New York, 1958.
28. Terranova M.L., Sessa V., Rossi M., Vitali G., Cappuccio G., Veroli C. J. Phys. IV. 5:1995;879.
29. Andreazza P., De Barros M.I., Andreazza-Vignolle C., Rats D., Vandenbulcke L. Thin Solid Films. 319:1998;62.
30. H.A. Lipsitt, J.A. Robertson, D.Y. Wang, Aerospace Research Laboratories, Internal Scientific Report ARL 66-0052 Office of Aerospace Research, March 1996.
31. Joffreau P.O., Haubner R., Lux B. J. Ref. Hard Met. 7:1988;186.
32. Weiser P.S., Prawer S., Hoffman A. J. Appl. Phys. 72:1992;4643.
33. Oral B., Ernst K., Schmutz C.J. Diamond Relat. Mater. 5:1996;932.
34. Grögler T., Zeiler E., Dannenfeldt M., Rosiwal S.M., Singer R.F. Diamond Relat. Mater. 6:1997;1658.
35. Rats D., Vandenbulcke L., Boher C., Farges G. Surf. Coat. Technol. 94 95:1997;555.
36. Okamoto H. J. Phase Equil. 14:1993;536.
37. O. Pacher, J. Stamberger, J. Keifer, in: J. Bloem, G. Verspui, L.R. Wolff (Eds.), Proc. 4th Eur. Conf. Chemical Vapour Deposition, Philips Congress Centre, Eindhoven, The Netherlands, 1983, p. 491.
38. L. Vandenbulcke, D. Rats, M.I. De Barros, G. Farges, Proc. 5th Int. Symp. Diamond Materials, in: J.L. Davidson, W.D. Brown, A. Gicquel, B.V. Spytsin, J.C. Angus (Eds.), The Electrochemical Society, Pennington, N.J., 1997, p. 442.
39. J. Crank, The Mathematics of Diffusion, 2nd ed., Clarendon Press, Oxford, 1975, p. 75.
40. Adelsberg L.M., Cadoff L.H. Trans. AIME. 239:1967;33.
41. Quinn C.J., Kohlstedt D.L. J. Am. Chem. Soc. 67:1984;305.
42. Vansant C.A., Phelps W.C. Jr. Trans. ASM. 59:1966;105.
43. Kõyama K., Hashimoto Y., Õmori S. Trans. Japan Inst. Metals. 16:1975;211.
44. Shcherbedinskaya A.V., Minkevich A.N. Izv. Vysshikh Uchebn. Zavedenii, Tsvetn. Met. 8:1965;123.
45. G.V. Samsonov, A.P. Epik, Coatings of High-temperature Materials, Part 1, Plenum Press, New York, 1966.
46. Nakonechnikov A.I., Pavlinov L.V., Bykov V.N. Fiz. Metal. Metalloved. 22:1966;234.
47. Wagner F.C., Bureur E.J., Steinberg M.A. Trans. ASM. 48:1956;742.
48. A.I. Nakonetchnikov, L.V. Pavlinov, Izvestija Academii Nauk SSSR Metalli, 3429-71 (Dep) (1972) 1.
49. C. Wagner, in: W. Jost (Ed.), Diffusion in Solids, Liquids, Gases, Academic Press, New York, 1960, p. 70.