Investigation of interfacial phenomena in Ag-Si multilayers during the annealing process

Journal of Materials Research

Volumn 14, Issue 7, 1999, Pages 2888-2892

  Zhao, J H ^a,b   Zhang, M ^b   Liu, R P ^b   Zhang, X Y ^b   Cao, L M ^b   Dai, D Y ^b   Chen, H ^b   Xu, Y F ^b   Wang, W K ^b  

^a YANSHAN UNIVERSITY   (China)

^b INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; DIFFUSION IN SOLIDS; GRAIN BOUNDARIES; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PARTICLES (PARTICULATE MATTER); SILVER; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

INTERFACIAL PHENOMENA;

MULTILAYERS;

EID: 0032670651     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0385     Document Type: Article

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