Fine-crystalline silicon grown at low temperatures: Investigations by high-resolution microscopy

Solid State Phenomena

Volumn 67, Issue , 1999, Pages 211-216

  Ross, Ch ^a   Herion, J ^a   Houben, L ^a   Carius, R ^a   Wagner, H ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; INTERFACES (MATERIALS); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING FILMS; SEMICONDUCTOR GROWTH; TRANSMISSION ELECTRON MICROSCOPY;

FINE-CRYSTALLINE SILICON FILMS;

SEMICONDUCTING SILICON;

EID: 0032666748     PISSN: 10120394     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.4028/www.scientific.net/ssp.67-68.211     Document Type: Article

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