Differential pulse voltammetry of toxic metal ions at the boron-doped CVD diamond electrode

Journal of Materials Science

Volumn 34, Issue 7, 1999, Pages 1439-1445

  Ramesham, R ^a,b  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^b AUBURN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ELECTRODES; ELECTROLYTES; FILM GROWTH; HYDROGEN; METHANE; MOLYBDENUM; PLASMA APPLICATIONS; POLYCRYSTALLINE MATERIALS; TRACE ANALYSIS;

DIFFERENTIAL PULSE VOLTAMMETRY;

DIAMOND FILMS;

EID: 0032664515     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004590029830     Document Type: Article

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