Fabrication of superconducting delay line with GaAs schottky diode

IEEE Transactions on Applied Superconductivity

Volumn 9, Issue 2 PART 3, 1999, Pages 3224-3227

  Koh, K ^a   Hohkawa, K ^a  

^a KANAGAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DELAY LINES; MICROSTRIP LINES; PHOTODIODES; POLYIMIDES; SCHOTTKY BARRIER DIODES; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR DEVICE MANUFACTURE; STRONTIUM COMPOUNDS; YTTRIUM BARIUM COPPER OXIDES;

EPITAXIAL LIFTOFF TECHNOLOGY; GALLIUM ARSENIDE METAL SEMICONDUCTOR METAL PHOTODIODE; GALLIUM ARSENIDE SCHOTTKY DIODE; POLYIMIDE FILM; SUPERCONDUCTING DELAY LINE;

SUPERCONDUCTING ELECTRIC LINES;

EID: 0032663490     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.783715     Document Type: Article

References (4)

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4. F. Ruders, O. Hollricher, C. A. Copetti, A. Förster, Ch. Bûchai W. Prusseit and H. Kinder, "Ultrahigh frequency measurements of magnetic penetration length and surface impedance of YBa2Cu3O7-x microstriplines on Si and GaAs substrates," J. Appl. Phys.77(10), 15 May, pp. 5282-5286, 1995.