Langmuir probe studies of a helicon plasma system

Plasma Sources Science and Technology

Volumn 8, Issue 3, 1999, Pages 397-403

  Schneider, T P ^a   Dostalik, W W ^a   Springfield, A D ^a   Kraft, R ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; CURRENT DENSITY; ELECTRONIC DENSITY OF STATES; ETCHING; HELICONS; IONS; PLASMA DEVICES; SEMICONDUCTOR DEVICE MANUFACTURE; TEMPERATURE;

COIL CURRENT RATIOS; ELECTRON ENERGY DISTRIBUTION; ELECTRON TEMPERATURE; HELICON PLASMA SYSTEM; ION CURRENT DENSITY; LANGMUIR PROBE; PLASMA PARAMETERS; PLASMA UNIFORMITY;

PLASMA SOURCES;

EID: 0032662918     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/8/3/309     Document Type: Article

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