Ion beam processing of oriented CuO films deposited on (1 0 0) YSZ by laser ablation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 155, Issue 1, 1999, Pages 97-101

  Lanke, U D ^a   Vedawyas, M ^b  

^a Ctr Adv Studs Mat Sci Solid S   (India)

^b INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ARGON; DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC RESISTANCE; ION BEAMS; ION BOMBARDMENT; ION IMPLANTATION; LASER ABLATION; PULSED LASER APPLICATIONS; RADIATION DAMAGE; YTTRIUM COMPOUNDS;

PULSED LASER DEPOSITION;

COPPER OXIDES;

EID: 0032658347     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00229-3     Document Type: Article

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