Inter-diffusion studies of SrBi2Ta2O9 film prepared on platinized wafer by pulsed laser ablation

Surface and Interface Analysis

Volumn 28, Issue 1, 1999, Pages 217-220

  Jiang, X H ^a   Tay, S T ^c   Wee, A T S ^a   Huan, C H A ^a   Liu, J M ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

FERROELECTRIC MATERIALS; INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); LASER ABLATION; PULSED LASER APPLICATIONS; SECONDARY ION MASS SPECTROMETRY; SILICON WAFERS; STRONTIUM COMPOUNDS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

PLATINIZED WAFER;

DIELECTRIC FILMS;

EID: 0032642616     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199908)28:1<217::AID-SIA580>3.0.CO;2-X     Document Type: Article

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