Control of film orientation: A parametric study of laser ablated FTO films on a-, c- and r-cut sapphire substrates by X-ray diffraction

Thin Solid Films

Volumn 349, Issue 1, 1999, Pages 51-55

  Dai, Z ^a   Miyashita, A ^a   Yamamoto, S ^a   Narumi, K ^a   Naramoto, H ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; DEPOSITION; FILM GROWTH; FILM PREPARATION; IRON COMPOUNDS; LASER ABLATION; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; SAPPHIRE; SUBSTRATES; THERMAL EFFECTS; THIN FILMS;

LASER ENERGY DENSITY; PULSED LASER DEPOSITION (PLD);

METALLIC FILMS;

EID: 0032640472     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00170-4     Document Type: Article

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