Electron emission characteristics of solidified gold alloy liquid metal ion sources

Applied Surface Science

Volumn 146, Issue 1, 1999, Pages 134-137

  Knapp, Wolfram ^a   Bischoff, Lothar ^b   Teichert, Jochen ^b  

^a OTTO VON GUERICKE UNIVERSITY   (Germany)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRON EMISSION; GOLD ALLOYS; ION SOURCES; LIQUID METALS; VACUUM TECHNOLOGY;

LIQUID METAL ION SOURCE (LMIS);

ELECTRON SOURCES;

EID: 0032635881     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00060-4     Document Type: Article

References (20)

1. Swanson L.W., Schwind G.A. J. Appl. Phys. 49:1978;5655.
2. Hata K., Nishigaki S., Watanabe M., Noda T., Tamura H., Watanabe H. J. Phys. 47:1986;C7-375.
3. Mitterauer J. J. Vac. Sci. Technol. B. 13:1995;625.
4. Mitterauer J. Appl. Surf. Sci. 87/88:1995;79.
5. Rao K.A., Bell A.E., Schwind G.A., Swanson L.W. J. Vac. Sci. Technol. B. 7:1989;1793.
6. Chen L.W., Wang Y.L. Appl. Phys. Lett. 72:1998;389.
7. Wagner A., Hall T.M. J. Vac. Sci. Technol. 16:1979;1871.
8. P.D. Prewett, G.L.R. Mair, Focused Ion Beams From Liquid Metal Ion Sources, Research Studies Press, Taunton, 1991.
9. B. Praprotnik, Emissionsverhalten von Flüssigmetall-Ionen-/Elektronen-Emitter, Thesis (in German), 1st edn., Köster-Verlag, Berlin, 1995.
10. Forbes R.G. Appl. Surf. Sci. 67:1993;9.
11. Liu W., Forbes R.G. Appl. Surf. Sci. 87/88:1995;122.
12. Hesse E., Driesel W., Dietzsch Ch., Bischoff L., Teichert J. Jpn. J. Appl. Phys. 35:1996;5564.
13. Driesel W., Dietzsch Ch. Appl. Surf. Sci. 93:1996;179.
14. Driesel W., Dietzsch Ch., Hesse E., Bischoff L., Teichert J. J. Vac. Sci. Technol. B. 14:1996;1621.
15. Mair G.L.R., Forbes R.G. Surf. Sci. 266:1992;180.
16. K. Jousten, K. Böhringer, R. Börret, S. Kalbitzer, Ultramicroscopy (1988) 301.
17. H.W.P. Koops, Ch. Schössler, Proc. 9th Int. Vac. Microelectr. Conf., St. Petersburg (1996) 458.
18. Mayer T.M., Adams D.P., Marder B.M. J. Vac. Sci. Technol. B. 14:1996;2438.
19. Hata K., Nishigaki S., Ionue M., Noda T., Tamura H. J. Phys. 48:1987;C6-177.
20. R.V. Latham (Ed.), High Voltage Vacuum Insulation, Academic Press, London, 1995.