Plasma dissociation reaction kinetics. I. Methyl methacrylate

Journal of Applied Polymer Science

Volumn 73, Issue 1, 1999, Pages 1-16

  Pan, Y Vickie ^a,c   Denton, Denice D ^b,d  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b University of Wisconsin Madison   (United States)

^c University of Washington   (United States)

^d University of Washington   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; CARBON MONOXIDE; CHEMICAL BONDS; DISSOCIATION; GLOW DISCHARGES; HYDROGEN; METHANOL; MONOMERS; PLASMA POLYMERIZATION; PRESSURE EFFECTS; PROPYLENE; REACTION KINETICS;

DIMETHYL KETENE;

POLYMETHYL METHACRYLATES;

EID: 0032634334     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1097-4628(19990705)73:1<1::AID-APP1>3.0.CO;2-4     Document Type: Article

References (43)

1. Boenig, H. V. In Advances in Low-Temperature Plasma Chemistry; Boenig, H. V., Ed.; Technomic: Lancaster, PA, 1984; Vol. 1, Chapter 1.
2. Williams, T.; Hayes, M. W. Nature 1966, 209, 769.
3. Morita, S.; Tamano, J.; Hattori, S.; Ieda, M. J Appl Phys 1980, 51, 3938.
4. Hattori, S.; Yamada, M.; Tamano, J.; Ieda, M.; Morita, S.; Yoneda, K.; Ikeda, S.; Ishibashi, S. J Appl Polym Sci Appl Polym Symp 1984, 38, 127.
5. Yamada, M.; Tamano, J.; Yoneda, K.; Morita, S.; Hattori, S. Jpn J Appl Phys 1982, 21, 768.
6. Madhukar, Z.; Suresh, G.; Sucheta, G.; Beena, K.; Sulabha, K.; Shashikala, G. Jpn J Appl Phys 1992, 31, 2640.
7. Tsai, Y.; Marrero, T. R.; Yasuda, H. K. J Appl Polym Sci 1994, 54, 1773.
8. Tobin, J. A. Ph.D. Thesis, University of Wisconsin-Madison, 1994.
9. Ralston, A. R. K.; Tobin, J. A.; Bajikar, S. S.; Denton, D. D. Sensors Actuators B 1994, 22, 139.
10. Li, G.; Tobin, J. A.; Denton, D. D. Appl Phys Lett 1993, 62, 1582.
11. Li, G.; Tobin, J. A.; Denton, D. D. Appl Phys Lett 1994, 64, 560.
12. O'Toole, L.; Short, R. D.; Ameen, A. P.; Jones, F. R. J Chem Soc Faraday Trans 1995, 91, 1363.
13. Zeuner, M.; Meischner, J. Vacuum 1995, 46, 27.
14. Pan, Y. V.; Denton, D. D. In 12th International Symposium on Plasma Chemistry Proceedings, 1995; Vol. 1, p 75.
15. Pan, Y. V.; Barrios, E. Z; Denton, D. D. J Polym Sci A Polym Chem 1998, 36, 587.
16. Pan, Y. V; Denton, D. D. Plasmas Polym 1997, 2, 165.
17. Pan, Y. V; Augustyniak, E; Denton, D. D. In 43rd American Vacuum Society National Symposium, 1996.
18. Ozden (Orhan), B; Hacaloglu, J; Akovali, G. Eur Polym J 1991, 27, 1405.
19. Tatsumi, M; Okashita, M; Matsunaga, T; Ashida, K; Yamamoto, S. Nippon Kagagu Kaishi 1989, 1909.
20. Denes, F; Sarmadi, M. A; Hop, C. E. C. A; Young, R. A. J Appl Polym Sci Appl Polym Symp 1994, 54, 55.
21. Suhr, H. In Techniques and Applications of Plasma Chemistry; Hollahan, J. R; Bell, A. T., Eds.; Wiley: New York, 1974; Chapter 2.
22. Maquestiau, A; Flammang, R; Pauwels, P. Org Mass Spectrosc 1983, 18, 547.
23. Pan, Y. V. Ph.D. Thesis, University of Wisconsin-Madison, 1997.
24. Nishikawa, K; Ono, K; Tuda, M; Oomori, T; Namba, K. Jpn J Appl Phys Part 1 1995, 34, 3731.
25. Nishikawa, K; Oomori, T; Ono, K; Tuda, M. Jpn J Appl Phys Part 1 1996, 35, 2421.
26. Goeckner, M. J; Breun, R. A. J Vac Sci Technol A 1993, 11, 689.
27. Goeckner, M. J; Henderson, M. A; Meyer, J. A; Breun, R. A. J Vac Sci Technol A 1994, 12, 3120.
28. Cleland, T. A; Hess, D. W. J Vac Sci Technol B 1989, 7, 35.
29. Cleland, T. A; Hess, D. W. J Appl Phys 1988, 68, 1068.
30. Cleland, T. A; Hess, D. W. J Electrochem Soc 1989, 136, 3103.
31. Morrison, P. W., Jr; Haigis, J. R. J Vac Sci Technol A 1993, 11, 490.
32. Jonas, S; Ptak, W. S; Sadowski, W; Walasek, E.; Paluszkiewicz, C. J Electrochem Soc 1995, 142, 2357.
33. Kaloyeros, A. E; Zheng, B; Lou, I; Lau, J; Hellgeth, J. W. Thin Solid Films 1995, 262, 20.
34. Venugopalan, M. Res Dev 1989, June, 62.
35. Walker, J. F. Formaldehyde; Robert E. Krieger: Huntington, New York, 1975.
36. Zyn, V. I. In Advances in Low-Temperature Plasma Chemistry, Technology, Applications; Boenig, H. V., Ed.; Technomic: Lancaster, PA, 1991; Vol. 3, pp 113-144.
37. Mach, R.; Drost, H. In Advances in Low-Temperature Plasma Chemistry, Technology, Applications; Boenig, H. V., Ed.; Technomic: Lancaster, PA, 1984; Vol. 1, pp 251-256.
38. Kondratiev, V. N.; Nikitin, E. E.; Talrose, V. L. In Properties and Applications of Low-Temperature Plasma; IUPAC; Butterworths: London, 1969; pp 367-387. Also in Pure Appl Chem 1969, 13, 345.
39. Kondratiev, V. N.; Nikitin, E. E.; Talrose, V. L. In Properties and Applications of Low-Temperature Plasma; IUPAC; Butterworths: London, 1969; pp 367-387. Also in Pure Appl Chem 1969, 13, 345.
40. Bell, A. T. J Macromol Sci-Chem A 1976, 10, 369.
41. Suhr, H. Plasma Chem Plasma Process 1983, 3, 1.
42. Yasuda, H.; Hsu, T. Surf Sci 1978, 76, 232.
43. Blaustein, B. D.; Fu, Y. C. In Techniques of Chemistry; Physical Methods of Chemistry, Vol. I, Part UB - Electrochemical Methods; Weissbeger, A.; Rossiter, B. W., Eds.; Wiley-Interscience: New York, 1971; Chapter 6.