Surfactant effect of atomic hydrogen on suicide-formation of nickel on Si(110) surfaces

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 612-615

  Ueda, Kazuyuki ^a   Ushirosako, Toyokazu ^a   Yoshimura, Masamichi ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

Auger; Hydrogen; Nickel; Scanning electron spectroscopy; Si(100); Si(110); Suicide

Indexed keywords

ANNEALING; HYDROGEN; LOW ENERGY ELECTRON DIFFRACTION; MONOLAYERS; NICKEL; SCANNING ELECTRON MICROSCOPY; SCREW CONVEYORS; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SURFACE ACTIVE AGENTS;

SILICIDES;

SEMICONDUCTING FILMS;

EID: 0032631623     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00125-X     Document Type: Article

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