Thermal stability of Al-O-N PVD films and comparison with Al2O3 films as diffusion barriers

Surface Engineering

Volumn 15, Issue 2, 1999, Pages 163-167

  Reichert, K ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANNEALING; CORROSION PROTECTION; FILM GROWTH; INTERDIFFUSION (SOLIDS); MAGNETRON SPUTTERING; NICKEL ALLOYS; SPUTTER DEPOSITION; SUPERALLOYS; SURFACE STRUCTURE; THERMODYNAMIC STABILITY; VAPOR DEPOSITION;

ALUMINUM NITRIDE; PHYSICAL VAPOR DEPOSITION (PVD);

PROTECTIVE COATINGS;

EID: 0032628777     PISSN: 02670844     EISSN: None     Source Type: Journal    
DOI: 10.1179/026708499101516399     Document Type: Article

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