Evidence of a two-stage reaction mechanism in sputter deposited Nb/Al multilayer thin-films studied by in situ synchrotron X-ray diffraction

Materials Letters

Volumn 39, Issue 5, 1999, Pages 268-273

  Lucadamo, G ^a   Barmak, K ^a   Hyun, S ^a   Cabral Jr , C ^b   Lavoie, C ^b  

^a Lehigh University   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; DIFFERENTIAL SCANNING CALORIMETRY; METALLOGRAPHIC MICROSTRUCTURE; NIOBIUM; NIOBIUM ALLOYS; REACTION KINETICS; SPUTTER DEPOSITION; SYNCHROTRON RADIATION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CROSS-SECTIONAL TRANSMISSION ELECTRON MICROSCOPY (XTEM); NIOBIUM ALUMINIDE;

METALLIC SUPERLATTICES;

EID: 0032628735     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(99)00017-8     Document Type: Article

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