Control of Coulomb blockade characteristics with dot size and density in planar metallic multiple tunnel junctions

Applied Physics Letters

Volumn 75, Issue 3, 1999, Pages 421-423

  Ford, E M ^a   Ahmed, H ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; DIFFUSION IN SOLIDS; ELECTRON TRANSPORT PROPERTIES; ELECTRON TUNNELING; ELECTROSTATICS; GOLD; ION BEAMS; ION BOMBARDMENT; NANOTECHNOLOGY;

COULOMB BLOCKADE; FOCUSED ION BEAM DEPOSITION; METALLIC MULTIPLE TUNNEL JUNCTIONS;

TUNNEL JUNCTIONS;

EID: 0032621130     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124395     Document Type: Article

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