Effects of elastic stress introduced by a silicon nitride cap on solid-phase crystallization of amorphous silicon

Journal of Applied Physics

Volumn 86, Issue 4, 1999, Pages 2278-2280

  Kimura, Yasuo ^a   Kishi, Masato ^b   Katoda, Takashi ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; COMPRESSIVE STRESS; CRYSTALLIZATION; DIELECTRIC FILMS; ELASTICITY; POLYCRYSTALLINE MATERIALS; RAMAN SPECTROSCOPY; SILICA; SILICON NITRIDE; STRESS ANALYSIS; TENSILE STRESS;

LASER RAMAN SPECTROSCOPY; RELAXED COMPRESSIVE STRESS; SOLID-PHASE CRYSTALLIZATION;

AMORPHOUS FILMS;

EID: 0032607712     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371042     Document Type: Article

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