Step-flow growth of SrTiO3 thin films with a dielectric constant exceeding 104

Applied Physics Letters

Volumn 74, Issue 23, 1999, Pages 3543-3545

  Lippmaa, M ^a   Nakagawa, N ^a   Kawasaki, M ^a   Ohashi, S ^a   Inaguma, Y ^a   Itoh, M ^a   Koinuma, H ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; DEPOSITION; EPITAXIAL GROWTH; FILM GROWTH; FILM PREPARATION; PERMITTIVITY; PULSED LASER APPLICATIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SINGLE CRYSTALS; STRONTIUM COMPOUNDS; SUBSTRATES; THIN FILMS;

PULSED LASER DEPOSITION METHOD; STEP-FLOW GROWTH;

SEMICONDUCTING FILMS;

EID: 0032607649     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124155     Document Type: Article

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