Low-frequency noise in polycrystalline semiconducting FeSi2 thin films

Journal of Applied Physics

Volumn 85, Issue 8 I, 1999, Pages 4091-4095

  Tassis, D H ^a   Dimitriadis, C A ^a   Brini, J ^b   Kamarinos, G ^b   Birbas, A ^c  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

^b Grenoble INP Phelma   (France)

^c UNIVERSITY OF PATRAS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC CURRENTS; ENERGY GAP; HOLE TRAPS; IRON ALLOYS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON COMPOUNDS; SIGNAL NOISE MEASUREMENT; THIN FILMS;

IRON DISILICIDE; MEYER-NELDEL RULE;

SEMICONDUCTING FILMS;

EID: 0032607056     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370316     Document Type: Article

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