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Journal of Applied Physics

Volumn 85, Issue 12, 1999, Pages 8432-8435

A microdeposition technique for carbon nanotubes based on electron beam lithography

(4) Ahlskog, M a,b Seynaeve, E b Vullers, R J M b Van Haesendonck, C b

a AALTO UNIVERSITY (Finland)

b UNIVERSITY OF LEUVEN (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; DEPOSITION; ELECTRODES; ELECTRON BEAM LITHOGRAPHY; PHOTORESISTS; PRECIPITATION (CHEMICAL); SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SYNTHESIS (CHEMICAL); THIN FILMS;

MICRODEPOSITION METHODS; MULTIWALLED NANOTUBES (MWNT); SINGLE WALL NANOTUBES (SWNT);

NANOTUBES;

EID: 0032607017 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.370623 Document Type: Article

Times cited : (11)

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