Interaction of Cu and Cu3Ge thin films with Si1 - XGex alloys

Applied Physics Letters

Volumn 75, Issue 12, 1999, Pages 1739-1741

  Aboelfotoh, M O ^a   Borek, M A ^a   Narayan, J ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COPPER; COPPER ALLOYS; CRYSTAL STRUCTURE; DIFFUSION IN SOLIDS; ELECTRIC CONDUCTIVITY OF SOLIDS; MOLECULAR BEAM EPITAXY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

COPPER GERMANIDE; SELECTED AREA DIFFRACTION; SILICON GERMANIDE;

METALLIC FILMS;

EID: 0032606856     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124804     Document Type: Article

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