Synthesis of chromium nitride films by ion-beam-enhanced-deposition

Materials Letters

Volumn 40, Issue 4, 1999, Pages 192-197

  Fu, Yongqing ^a   Zhu, Xiaodong ^a   Tang, Bin ^a   Hu, Xinfang ^a   He, Jiawen ^a   Xu, Kewei ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; FILM PREPARATION; ION BEAMS; ION BOMBARDMENT; MICROHARDNESS; MICROSTRUCTURE; SYNTHESIS (CHEMICAL); THIN FILMS; TRIBOLOGY;

CHROMIUM NITRIDE FILMS; ION BEAM CURRENT; ION BEAM ENHANCED DEPOSITION; ION BOMBARDMENT ENERGY;

NITRIDES;

EID: 0032592685     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(99)00074-9     Document Type: Article

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