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Volumn 30, Issue 8, 1999, Pages 2121-2127

Influence of annealing on depth distributions and microstructure of ion-implanted Ti6Al4V

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRON ENERGY LEVELS; ION IMPLANTATION; METALLOGRAPHIC MICROSTRUCTURE; THERMAL EFFECTS; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; WEAR OF MATERIALS; X RAY DIFFRACTION ANALYSIS;

EID: 0032592527     PISSN: 10735623     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11661-999-0023-y     Document Type: Article
Times cited : (9)

References (37)
  • 8
    • 0021293985 scopus 로고
    • G.K. Hubler, O.W. Holland, C.R. Clayton, and C.W. White, eds., Materials Research Society, Pittsburgh, PA
    • R.G. Vardiman: Materials Research Society Symposia Proceedings, G.K. Hubler, O.W. Holland, C.R. Clayton, and C.W. White, eds., Materials Research Society, Pittsburgh, PA, 1984, vol. 27, pp. 699-704.
    • (1984) Materials Research Society Symposia Proceedings , vol.27 , pp. 699-704
    • Vardiman, R.G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.