Epitaxial growth of diamond on an iridium (100) substrate by microwave plasma-assisted chemical vapor deposition

Materials Research Society Symposium - Proceedings

Volumn 555, Issue , 1999, Pages 333-338

  Tsubota, Toshiki ^a   Tsuruga, Shigenori ^a   Saito, Takeyasu ^a   Kusakabe, Katsuki ^a   Morooka, Shigeharu ^a   Maeda, Hideaki ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; GASES; IRIDIUM; MAGNESIUM COMPOUNDS; METHANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPUTTERING; TEMPERATURE;

MAGNESIUM OXIDE; MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION;

SYNTHETIC DIAMONDS;

EID: 0032591055     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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