Characterization of a distributed feedback laser with air/semiconductor gratings embedded by the wafer fusion technique

IEEE Journal of Quantum Electronics

Volumn 35, Issue 9, 1999, Pages 1277-1283

  Imada, Masahiro ^a   Noda, Susumu ^a,c   Kobayashi, Hidetoshi ^b   Sasaki, Goro ^b  

^a KYOTO UNIVERSITY   (Japan)

^b SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

^c MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; DIFFRACTION GRATINGS; ESTIMATION; OPTICAL MATERIALS; REFRACTIVE INDEX; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR DEVICE STRUCTURES; SILICON WAFERS;

SEMICONDUCTOR GRATINGS; SURFACE EMITTING LASERS; WAFER BONDING; WAFER FUSION;

DISTRIBUTED FEEDBACK LASERS;

EID: 0032590977     PISSN: 00189197     EISSN: None     Source Type: Journal    
DOI: 10.1109/3.784587     Document Type: Article

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