Technical aspects of an efficient multiple solvent suppression pulse sequence

Magnetic Resonance in Chemistry

Volumn 37, Issue 1, 1999, Pages 7-14

  Dalvit, Claudio ^a   Shapiro, Gideon ^a,d   Böhlen, Jean Marc ^b   Parella, Teodor ^c  

^a NOVARTIS PHARMA AG   (Switzerland)

^b Bruker AG   (Switzerland)

^c UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^d Sulfonics Inc   (United States)

Author keywords

Excitation sculpting sequence; LC NMR; Multiple solvent suppression; NMR; Pulsed field gradients; Solvent mixtures

Indexed keywords

CHOICE OF PARAMETERS; EXCITATION SCULPTING; EXCITATION SCULPTING SEQUENCE; LC-NMR; MULTIPLE SOLVENT SUPPRESSION; PULSE SEQUENCE; PULSED FIELD GRADIENTS; SOLVENT MIXTURES; SOLVENT SUPPRESSION; TECHNICAL ASPECTS;

SOLVENTS;

EID: 0032590085     PISSN: 07491581     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1097-458X(199901)37:1<7::AID-MRC398>3.0.CO;2-F     Document Type: Article

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