Blue and red photoluminescence from Ge+ implanted SiO2 films and its multiple mechanism

Applied Physics Letters

Volumn 73, Issue 13, 1998, Pages 1790-1792

  Zhang, Jia Yu ^a   Bao, Xi Mao ^a   Ye, Yong Hong ^b   Tan, Xi Lin ^b  

^a NANJING UNIVERSITY   (China)

^b NANJING NORMAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; EXCITONS; FILMS; GERMANIUM; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; SPECTRUM ANALYSIS; X RAY DIFFRACTION;

BROAD RED BAND; IMPLANTATION INDUCED DEFICIENT CENTER; RED BAND SHIFT; STRONG BLUE BAND;

PHOTOLUMINESCENCE;

EID: 0032575809     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122283     Document Type: Article

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