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Volumn 72, Issue 10, 1998, Pages 1131-1133
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Fabrication of a low-operating voltage diamond thin film metal-semiconductor-metal photodetector by laser writing lithography
a a a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
DIAMOND FILMS;
ELECTRODES;
FILM GROWTH;
GRAIN SIZE AND SHAPE;
IMAGE PROCESSING;
INCLUSIONS;
PHOTOLITHOGRAPHY;
POLYCRYSTALLINE MATERIALS;
RELIABILITY;
SEMICONDUCTOR DEVICE STRUCTURES;
THIN FILMS;
DIAMOND GRAINS;
LASER WRITING LITHOGRAPHY;
POLYCRYSTALLINE FILMS;
SACRIFICIAL LAYER INCLUSION;
ULTRAVIOLET DETECTORS;
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EID: 0032498766
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.120992 Document Type: Article |
Times cited : (9)
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References (6)
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