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Volumn 31, Issue 21, 1998, Pages 3004-3008

Cathodoluminescence evidence of stress-induced outdiffusion of beryllium in AlGaAs/GaAs heterojunction bipolar transistors

Author keywords

[No Author keywords available]

Indexed keywords

BERYLLIUM; CATHODOLUMINESCENCE; EMISSION SPECTROSCOPY; INTERDIFFUSION (SOLIDS); MOLECULAR BEAM EPITAXY; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR DOPING; STRESSES;

EID: 0032494621     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/31/21/004     Document Type: Article
Times cited : (8)

References (9)
  • 1
    • 0026835069 scopus 로고
    • The effects of base dopant diffusion on dc and rf characteristics of InGaAs/InAlAs heterojunction bipolar transistors
    • Hafizi M, Metzger R, Stanchina W E, Rensch D B, Jensen J F and Hooper W W 1992 The effects of base dopant diffusion on dc and rf characteristics of InGaAs/InAlAs heterojunction bipolar transistors IEEE Electron Device Lett. 13 140-2
    • (1992) IEEE Electron Device Lett. , vol.13 , pp. 140-142
    • Hafizi, M.1    Metzger, R.2    Stanchina, W.E.3    Rensch, D.B.4    Jensen, J.F.5    Hooper, W.W.6
  • 2
    • 0027625334 scopus 로고
    • Characterization of current-induced degradation in Be-doped HBTs based in GaAs and InP
    • Tanaka S, Shimawaki H, Kasahara K and Honjo K 1993 Characterization of current-induced degradation in Be-doped HBTs based in GaAs and InP IEEE Trans. Electron Devices 40 1194-200
    • (1993) IEEE Trans. Electron Devices , vol.40 , pp. 1194-1200
    • Tanaka, S.1    Shimawaki, H.2    Kasahara, K.3    Honjo, K.4
  • 3
    • 0026854047 scopus 로고
    • Heavily doped GaAs (Be)/AlGaAs HBTs grown by MBE with high device performances and high thermal stability
    • Jourdan N, Alexandre F, Dubon-Chavallier C, Dangla J and Gao Y 1993 Heavily doped GaAs (Be)/AlGaAs HBTs grown by MBE with high device performances and high thermal stability IEEE Trans. Electron Devices 39 767-70
    • (1993) IEEE Trans. Electron Devices , vol.39 , pp. 767-770
    • Jourdan, N.1    Alexandre, F.2    Dubon-Chavallier, C.3    Dangla, J.4    Gao, Y.5
  • 4
    • 0030243576 scopus 로고    scopus 로고
    • Negative VBE shift due to base dopant outdiffusion in DHBT
    • Borgarino M, Paorici F and Fantini F 1996 Negative VBE shift due to base dopant outdiffusion in DHBT Solid State Electron. 39 1305-10
    • (1996) Solid State Electron. , vol.39 , pp. 1305-1310
    • Borgarino, M.1    Paorici, F.2    Fantini, F.3
  • 5
    • 0026836195 scopus 로고
    • Cathodoluminescence spectroscopy: An accurate technique for the characterization of the fabrication technology of GaAlAs/GaAs heterojunction bipolar transistors
    • Papadopoulo A C, Dubon-Chevallier C and Bresse J F 1992 Cathodoluminescence spectroscopy: an accurate technique for the characterization of the fabrication technology of GaAlAs/GaAs heterojunction bipolar transistors Scanning Microsc. 6 97-103
    • (1992) Scanning Microsc. , vol.6 , pp. 97-103
    • Papadopoulo, A.C.1    Dubon-Chevallier, C.2    Bresse, J.F.3
  • 7
    • 0027904738 scopus 로고
    • Study of ALMBE growth conditions for the preparation of compositionally graded AlGaAs/GaAs structures
    • Madella M, Bosacchi A, Franchi S, Allegri P and Avanzini V 1993 Study of ALMBE growth conditions for the preparation of compositionally graded AlGaAs/GaAs structures J. Cryst. Growth 127 270
    • (1993) J. Cryst. Growth , vol.127 , pp. 270
    • Madella, M.1    Bosacchi, A.2    Franchi, S.3    Allegri, P.4    Avanzini, V.5
  • 8
    • 36449003597 scopus 로고
    • Recombination-enhanced impurity diffusion in Be-doped GaAs
    • Uematsu M and Wada K 1991 Recombination-enhanced impurity diffusion in Be-doped GaAs Appl. Phys. Lett. 58 2015-17
    • (1991) Appl. Phys. Lett. , vol.58 , pp. 2015-2017
    • Uematsu, M.1    Wada, K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.