Nano-machining of silicon phthalocyanine dichloride films on H-passivated Si(111)

Journal of Physics D: Applied Physics

Volumn 31, Issue 9, 1998, Pages

  Miao, P ^a   Robinson, A W ^a   Palmer, R E ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENT MEASUREMENT; NANOTECHNOLOGY; PASSIVATION; SCANNING TUNNELING MICROSCOPY; SILICON COMPOUNDS; SILICON WAFERS; SPECTROSCOPIC ANALYSIS; VOLTAGE MEASUREMENT;

SILICON PHTHALOCYANINE DICHLORIDE;

SEMICONDUCTING FILMS;

EID: 0032492815     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/31/9/001     Document Type: Article

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