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Materials Science and Engineering B

Volumn 55 B55, Issue 3, 1998, Pages 195-200

Oxidation dependent crystallization behaviour of IO and ITO thin films deposited by reactive thermal deposition technique

(2) Thilakan, P a Kumar, J a

a ANNA UNIVERSITY (India)

Author keywords

Indium oxide; Indium tin oxide; Predomiant plane; Reactive thermal deposition

Indexed keywords

CONDUCTIVE FILMS; CRYSTALLIZATION; DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; ENERGY GAP; OXIDATION; OXIDES; SUBSTRATES; THIN FILMS; TIN ALLOYS;

INDIUM OXIDE; INDIUM TIN OXIDE; THERMAL DEPOSITION TECHNIQUE;

INDIUM COMPOUNDS;

EID: 0032483261 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/s0921-5107(98)00209-8 Document Type: Article

Times cited : (35)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.