Proposal of a novel in situ stress-reducing method for the growth of c-BN

Thin Solid Films

Volumn 326, Issue 1-2, 1998, Pages 43-46

  Ullmann, Jens ^a,b  

^a UNIVERSITY OF HEIDELBERG   (Germany)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

Cubic boron nitride; In situ implantation; Stress

Indexed keywords

CERAMIC COATINGS; FILM GROWTH; ION IMPLANTATION; RELAXATION PROCESSES; STRESSES;

IN SITU IMPLANTATION; INTRINSIC STRESS;

CUBIC BORON NITRIDE;

EID: 0032482831     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00525-2     Document Type: Article

References (9)

1. P.B. Mirkarimi, K.P. McCarty, D.L. Medlin, Mater. Sci. Eng. Rep. (1997) submitted.
2. P. Widmayer, P. Ziemann, S. Ulrich, H. Ehrhardt, Diamond Relat. Mater. 6 (1997) 621.
3. S. Ulrich, J. Scherer, J. Schwan, I. Barzen, K. Jung, H. Ehrhardt, Diamond Relat. Mater. 4 (1995) 289.
4. M. Okamoto, H. Yokoyama, Y. Osaka, Jap. J. Appl. Phys. 29 (1990) 930.
5. J. Ullmann, A.J. Kellock, J.E.E. Baglin, Surf. Coat. Technol., 1997 submitted.
6. J. Ullmann, A.J. Kellock, J.E.E. Baglin, Appl. Phys., 1997 in press.
7. J.R. Sanjourjo, E. Lopez-Cruz, P. Vogl, M. Cardona, Phys. Rev. B. 28 (1983) 4579.
8. J. Ullmann, K. Baba, P. Heger, K. Pinkert, Nucl. Instrum. Methods B. 106 (1995) 96.
9. J.P. Biersack, J.F. Ziegler, TRIM-code, Version 95.06, IBM Research Center, New York, 1995.