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Volumn 195, Issue 1-4, 1998, Pages 524-529

High-quality InAs/GaAs quantum dots grown by low-pressure metalorganic vapor-phase epitaxy

Author keywords

InAs; Microcavity; MOVPE; Photoluminescence; Quantum dots; TEM; X ray diffraction

Indexed keywords

ELECTRIC VARIABLES MEASUREMENT; HIGH RESOLUTION ELECTRON MICROSCOPY; METALLORGANIC VAPOR PHASE EPITAXY; PHOTOLUMINESCENCE; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR GROWTH; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 0032477231     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(98)00580-6     Document Type: Article
Times cited : (5)

References (12)
  • 2
    • 0003703851 scopus 로고
    • E. Burstein, C. Weisbuch (Eds.), Plenum Press, New York
    • J.M. Gérard, in: E. Burstein, C. Weisbuch (Eds.), Confined Electrons and Photons, Plenum Press, New York, 1995.
    • (1995) Confined Electrons and Photons
    • Gérard, J.M.1
  • 6
    • 0348088590 scopus 로고    scopus 로고
    • French Patent 84-12788, August 1984
    • R. Mellet, French Patent 84-12788, August 1984.
    • Mellet, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.