Effect of annealing and hydrogen plasma treatment on the voltammetric and impedance behavior of the diamond electrode

Thin Solid Films

Volumn 315, Issue 1-2, 1998, Pages 222-228

  Ramesham, R ^a,b  

^a AUBURN UNIVERSITY   (United States)

^b CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

AC impedance; Annealing; CVD diamond; Cyclic voltammetry; Diamond; Electrochemistry; Hydrogen plasma treatment; Photovoltage; Plasma processing and deposition

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CYCLIC VOLTAMMETRY; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC IMPEDANCE; ELECTROCHEMISTRY; HYDROGEN; PLASMA APPLICATIONS; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; THIN FILMS;

HYDROGEN PLASMA TREATMENT;

DIAMOND FILMS;

EID: 0032473284     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00592-0     Document Type: Article

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