Parameter extraction with neural networks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3332, Issue , 1998, Pages 654-664

  Cazzanti, Luca ^a   Khan, Mumit ^a   Cerrina, Franco ^a  

^a Wisconsin Electric Machines and Power Electronics Consortium   (United States)

Author keywords

Aerial image; Fidelity; Linewidth; Neural networks; Parameter extraction

Indexed keywords

COMPUTER AIDED DESIGN; LITHOGRAPHY; MAPPING; SEMICONDUCTOR MATERIALS;

AERIAL IMAGES; PARAMETER EXTRACTION;

NEURAL NETWORKS;

EID: 0032402413     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.308780     Document Type: Conference Paper

References (12)

1. Modeling X-ray proximity lithography
2. Time series modeling of reactive ion etching using neural networks
3. Use of neural networks in modeling semiconductor manufacturing processes: An example for plasma etch modeling
4. A neural network model of a contact plasma etch process for VLSI production
5. Using neural networks process models to perform PECVD silicon dioxide recipe synthesis via genetic algorithms
6. Semi-empirical neural network modeling of metal-organic chemical vapor deposition