Beamline for metrology of x-ray/EUV optics at the advanced light source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3113, Issue , 1997, Pages 214-221

  Underwood, J H ^a   Gullikson, E M ^a   Koike, M ^a   Batson, P J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Calibration; Extreme ultraviolet; Monochromators; Reflectometry; Standards; X rays

Indexed keywords

ABERRATIONS; CALIBRATION; LIGHT SOURCES; MIRRORS; MONOCHROMATORS; OPTICAL MULTILAYERS; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; REFLECTOMETERS; ULTRAVIOLET RADIATION; X RAY OPTICS;

DEMAGNIFICATION; PROJECTION LITHOGRAPHY;

DIFFRACTION GRATINGS;

EID: 0031310652     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.278850     Document Type: Conference Paper

References (9)

1. Varied-space grazing incidence gratings in high resolution scanning spectrometers
2. A new optical design method and its application to an extreme ultraviolet varied line spacing plane grating monochromator
3. Experimental comparison of mechanically ruled and holographically recorded gratings for a varied-line-spacing plane-grating monochromator
4. Generation of a parallel x-ray beam and its use for testing collimators
5. Non-specular scattering from multilayer mirrors at normal incidence
6. Molybdenum-silicon multilayer mirrors for the extreme ultraviolet