Characterization of niobium-doped lead titanate thin films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 9 SUPPL. B, 1996, Pages 4995-4998

  Ibrahim, Ricardo Cury ^a   Sakai, Takamitsu ^a   Nishida, Takashi ^a   Horiuchi, Toshihisa ^a   Shiosaki, Tadashi ^a   Matsushige, Kazumi ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Dielectric properties of niobium doped lead titanate thin film; Ferroelectric thin films; Lead titanate thin film; Niobium doped lead titanate; Reactive sputter deposited lead titanate film

Indexed keywords

FERROELECTRIC THIN FILM; LEAD TITANATE;

EXPERIMENTS; FERROELECTRIC MATERIALS; LEAD; NIOBIUM; SILICON; TITANIUM; X RAY DIFFRACTION;

THIN FILMS;

EID: 0030234796     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.4995     Document Type: Article

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