Comparison of surface PSD's calculated from both AFM profiles and scatter data

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3275, Issue , 1998, Pages 37-46

  Stover, John C ^a   Ivakhnenko, Vladimir I ^a   Scheer, Craig A ^a  

^a ADE Optical Systems   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; LIGHT POLARIZATION; MIRRORS; PROBABILITY DENSITY FUNCTION; RAYLEIGH SCATTERING; SILICON WAFERS;

PROFILE MEASUREMENTS;

SURFACE MEASUREMENT;

EID: 0032387901     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.304410     Document Type: Conference Paper

References (11)

1. Residual surface roughness of diamond-turned optics
2. Roughness characterization of smooth machined surfaces by light scattering
3. The prediction of BRDFs from surface profile measurements
4. Microroughness of silicon wafers
5. Standard practice for estimating the power spectral density function and related finish parameters from surface profile data
6. Wavelength scaling investigation of several materials
7. Angular dependence and polarization of out-of-plane optical scattering from particulate contamination, subsurface defects, and surface microroughness
8. Rayleigh scattering limits for low-level bi-directional reflectancedistribution function (BRDF) measurements
9. Optimal estimation of finish parameters
10. Instrumental effects in surface finish measurement