Growth and properties of YMnO3 thin films for nonvolatile memories

Journal of the Korean Physical Society

Volumn 32, Issue 4 SUPPL., 1998, Pages

  Yoshimura, Takeshi ^a   Fujimura, Norifumi ^a   Aoki, Nobuaki ^a   Hokayama, Kouzo ^a   Tsukui, Shigeki ^a   Kawabata, Keisuke ^a   Ito, Taichiro ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032364602     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

1. J. F. Scott and C. A. Paz de Araujo, Science 246, 1400 (1989).
2. C. A. Paz de Araujo, J. D. Cuchiaro, L. D. McMillan, M. C. Scott and J. F. Scott, Nature 374, 627 (1995).
3. Y. Shichi, S. Tanimoto, T. Goto, K. Kuroiwa and Y. Tarui, Jpn. J. Appl. Phys. 33, 5172 (1994).
4. A. Masuda, Y. Yamanaka, M. Tazoe, Y. Yonezawa, A. Morimoto and T. Shimizu, Jpn. J. Appl. Phys. 34, 5154 (1995).
5. I. Sakai, E. Tokumitsu and H. Ishiwara, Jpn. J. Appl. Phys. 35, 4987 (1996).
6. N. Fujimura, T. Ishida, T. Yoshimura and T. Ito, Appl. Phys. Lett. 69, 1011 (1996).
7. N. Fujimura, S. Azuma, N. Aoki, T. Yoshimura and T. Ito, J. Appl. Phys. 80, 7084 (1996).
8. T. Yoshimura, N. Fujimura, N. Aoki, K. Hokayama, S. Tukui, K. Kawabata and T. Ito, Jpn. J Appl. Phys., to be published.
9. G. A. Smolenskii and V. A. Bokov, J. Appl. Phys. 35, 915 (1964).