Comparison of Si/SiO2 interface roughness from electron cyclotron resonance plasma and thermal oxidation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 1, 1998, Pages 57-62

  Zhao, C ^a   Hu, Y Z ^a   Labayen, T ^a   Lai, L ^a   Irene, E A ^a  

^a University of North Carolina at Chapel Hill   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032350134     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581011     Document Type: Review

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