Quantitative measurement of nodule formation in W-Ti sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 4, 1998, Pages 2418-2422

  Lo, Chi Fung ^a   Draper, Darryl ^a  

^a Materials Research Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032349739     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581361     Document Type: Article

References (12)

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