Effects of ion pretreatments on the nucleation of silicon on silicon dioxide

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 6, 1998, Pages 3223-3226

  Basa, C ^a   Hu, Y Z ^a   Tinani, M ^a   Irene, E A ^a  

^a University of North Carolina at Chapel Hill   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032344745     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581526     Document Type: Article

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