Optical second-harmonic generation in sputter-deposited AlN films

Journal of Applied Physics

Volumn 84, Issue 11, 1998, Pages 5922-5927

  Kiehne, G T ^a   Wong, G K L ^a,b   Ketterson, J B ^a,c  

^a NORTHWESTERN UNIVERSITY   (United States)

^b HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

^c Dept of Elec and Comp Engineering ^*

Author keywords

[No Author keywords available]

Indexed keywords

BOROSILICATE GLASS; ELLIPSOMETRY; HIGH TEMPERATURE EFFECTS; LIGHT POLARIZATION; MAGNETRON SPUTTERING; REFRACTIVE INDEX; SECOND HARMONIC GENERATION; SUBSTRATES; THICK FILMS; X RAY DIFFRACTION;

ALUMINUM NITRIDE; CRYSTALLOGRAPHIC TEXTURE AXIS; OPTICAL SECOND HARMONIC GENERATION; TILT ANGLE;

ALUMINUM COMPOUNDS;

EID: 0032337198     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368908     Document Type: Article

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