High average emission sites density of electron field emission from broad area diamond-amorphous carbon thin films

Chinese Physics Letters

Volumn 15, Issue 8, 1998, Pages 611-612

  Wang, Xiao Ping ^a,b   Yao, Ning ^a   Li, Yun Jun ^a   Zhang, Bing Lin ^a  

^a ZHENGZHOU UNIVERSITY   (China)

^b ZHENGZHOU INSTITUTE OF AERONAUTICAL INDUSTRY MANAGEMENT   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; FIELD EMISSION; GRAPHITE; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION;

AMORPHOUS CARBON FILMS; AMORPHOUS CARBON THIN FILMS; BROAD AREAS; DENSITY OF ELECTRONS; ELECTRON FIELD EMISSION; MICROWAVE CHEMICAL VAPOR DEPOSITION; MO SUBSTRATES; PARTICULATES; SITE DENSITY; VAPOR-DEPOSITION TECHNIQUES;

AMORPHOUS FILMS;

EID: 0032336170     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/15/8/024     Document Type: Article

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